Methane - Semiconductor Grade
CH4
High purity methane is produced from liquefied natural gas by a combination of purification techniques including molecular sieve and cryogenic fractional distillation. It is used to modulate the etch rate in the etch process step. Methane mixtures are also used to etch compound semiconductors. Ultra high purity methane is also used in the manufacture of artificial diamonds.
Standard Specifications
| Purity / Assay Impurities (Mol ppm) | 5.0 99.999% | 5.5 99.9995% | 6.0 99.9999% |
|---|---|---|---|
| Nitrogen | < 5 | < 1 | < 0.5 |
| Oxygen | < 2 | < 1 | < 0.5 |
| Ethane | < 5 | < 3 | < 0.5 |
| Other Hydrocarbons | < 2 | < 1 | < 0.5 |
| Moisture** | < 2 | < 1 | < 0.5 |
| Total Impurities | < 10 | < 5 | < 0.5 |
Please contact us if the specification you require is not shown above. AGT International is able to custom manufacture different specifications according to your requirements.
Standard Cylinder Sizes and Fill Volumes
| Cylinder Information | |
|---|---|
| Cylinder Size | Fill Volume (m3) |
| H50 | 12.4 |
| H49 | 10.2 |
If you require a different container size please contact us.
Technical Information
| Technical Data | Shipping Information | ||
|---|---|---|---|
| Molecular Weight (g/mol) | 16.043 | Shipping Name | Methane, compressed |
| Liquid Density (kg/m³) | 422.6 | Hazard Class | 2.1 |
| Gas Density (kg/m³) | 1.189 | UN No. | UN 1971 |
| Boiling point (°C) | -161.6 | Hazard Label | Flammable gas |
| Specific Volume (m³/kg) | 1.48 | CAS No. | 630-08-0 |
| Vapour Pressure (bar.a @ 20°C) | N/A | ||
| Valve Outlet | CGA 350 / BS 4 / DIN 1 |