Carbon Monoxide – Semiconductor Grade
CO
High purity carbon monoxide is produced from lower purity material by a combination of purification techniques including molecular sieve and cryogenic fractional distillation. It is used to modulate the etch rate in the overall etch process step, improving etch selectivity for greater control of etch profiles.
Standard Specifications
Purity / Assay Impurities (Mol ppm) | 4.7* 99.997% | 5.0* 99.999% |
---|---|---|
Nitrogen / Argon | < 20 | < 5 |
Oxygen | < 3 | < 2 |
Carbon Dioxide | < 5 | < 2 |
Methane | < 5 | < 2 |
Moisture ** | < 3 | < 2 |
Total Impurities | < 30 | < 10 |
* Specification only guaranteed if filled into aluminium cylinders
** Moisture Specification only guaranteed if cylinders prepared by AGT International
Please contact us if the specification you require is not shown above. AGT International is able to custom manufacture different specifications according to your requirements.
Standard Cylinder Sizes and Fill Volumes
Cylinder Information | |
---|---|
Cylinder Size | Fill Volume (m3) |
H46A | 6.3 |
If you require a different container size please contact us.
Technical Information
Technical Data | Shipping Information | ||
---|---|---|---|
Molecular Weight (g/mol) | 28.01 | Shipping Name | Carbon monoxide, compressed |
Liquid Density (kg/m³) | 788.6 | Hazard Class | 2.3 |
Gas Density (kg/m³) | 4.355 | UN No. | UN 1016 |
Boiling point (°C) | -191.6 | Hazard Label | Flammable gas, toxic gas |
Specific Volume (m³/kg) | 0.862 | CAS No. | 630-08-0 |
Vapour Pressure (bar.a @ 20°C) | N/A | ||
Valve Outlet | CGA 350 / BS 4 / DIN 5 |